发明名称 |
Exposure Method and Apparatus, and Electronic Device Manufacturing Method |
摘要 |
An object is to provide a high-resolution and economical exposure method suitable for use in formation of a fine pattern for making up an electronic device. Two diffraction gratings (P1, P2) are located in series in an optical path; the two diffraction gratings (P1, P2) and a wafer or the like (W) for making up an electronic device are arranged with a predetermined spacing; a light-dark pattern of interference fringes generated by the diffraction gratings (P1, P2) is transferred onto the wafer or the like (W) to effect exposure. The exposure is done while changing a positional relation between the wafer or the like (W) and the diffraction gratings (P1, P2) according to need.
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申请公布号 |
US2009011368(A1) |
申请公布日期 |
2009.01.08 |
申请号 |
US20060884891 |
申请日期 |
2006.02.23 |
申请人 |
ICHIHARA YUTAKA;NAKAMURA AYAKO;SHIRAISHI NAOMASA;TANIMOTO AKIKAZU;KUDO YUJI |
发明人 |
ICHIHARA YUTAKA;NAKAMURA AYAKO;SHIRAISHI NAOMASA;TANIMOTO AKIKAZU;KUDO YUJI |
分类号 |
G03F7/22;G03B27/42;G03B27/72 |
主分类号 |
G03F7/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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