| 发明名称 |
BATCH PROCESSING CHAMBER WITH DIFFUSER PLATE AND INJECTOR ASSEMBLY |
| 摘要 |
An apparatus for batch processing of a wafer is disclosed. In one embodiment the batch processing apparatus includes a bell jar furnace having a diffuser disposed between gas inlets and the substrate positioned within the furnace to direct flows within the chamber around the perimeter of the substrate.
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| 申请公布号 |
KR20090010230(A) |
申请公布日期 |
2009.01.29 |
| 申请号 |
KR20087029841 |
申请日期 |
2008.12.05 |
| 申请人 |
APPLIED MATERIALS INC. |
发明人 |
YUDOVSKY JOSEPH;NGO TAI T.;TEJAMO CESAR;MAHAJANI MAITREYEE;MCDOUGALL BRENDAN;HUANG YI CHIAU;COOK ROBERT C.;KIM YEONG K.;TAM ALEXANDER;BRAILOVE ADAM A.;GHANAYEM STEVE G. |
| 分类号 |
H01L21/00;H01L21/02;H01L21/205 |
主分类号 |
H01L21/00 |
| 代理机构 |
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