COMPOSITIONS AND METHODS FOR MULTIPLE EXPOSURE PHOTOLITHOGRAPHY

摘要

PURPOSE: A composition for multi-exposure photolithography is provided to enable good applications to various photoresists and to be suitable for a multi-exposure photolithography process. CONSTITUTION: A composition for multi-exposure photolithography includes a matrix polymer, crosslinking agent, tertiary or more functional primary amines, and solvent. A polyfunctional aromatic methanol derivative is further included. A polyfunctional aromatic methanol derivative is further included. The matrix polymer is alcohol-soluble and water system-soluble.