| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a slurry supplying apparatus and method, and a polishing apparatus and method which are capable of maintaining a supply amount of slurry at a constant. SOLUTION: This slurry supplying apparatus 20 for supplying slurry 22 to an article to be polished has a slurry tank 21 for storing the slurry 22, a pump 24 for pumping the slurry 22 stored in the slurry tank 21, a flow meter 26 for measuring a flow rate of the slurry 22 sucked by the pump 24, a controller 27 for controlling a suction operation of the pump 24 based on the measurement of the flow meter 26, and a three-way valve 29 for switching a flow of the slurry 22 passing through the flow meter 26 between a side of the slurry tank 21 and a side of the article to be polished.</p> |
