| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma processing apparatus which can obtain a uniform plasma distribution by preventing a field concentration. <P>SOLUTION: The plasma processing apparatus includes an introducing piping for introducing a treating gas, and an exhaust pipe for exhausting inside of a vessel. The plasma processing apparatus further includes a plasma treating vessel 109 for generating a plasma in the interior, a substrate electrode 111 for placing and holding a sample 110 in the treating vessel 109, a dielectric plate 107 disposed on the upper surface of the treating vessel, an antenna element group having a plurality of circular arc-like antenna elements 106 disposed along the periphery of the dielectric plate, and a power dividing unit 104 for dividing a high frequency power into a plurality and supplying the divided high frequency powers to the plurality of the antenna elements 106 only from the same one direction end of the periphery. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
