| 摘要 |
<p>A lithographic apparatus and a device manufacturing method are provided to maximize the relative moving speed of a liquid supply system and a substrate without the breakdown of meniscus. A lithographic apparatus includes an illumination system(IL), a supporting body(MT), a patterning device(MA), a first position establisher(PM), a substrate table(WT), a second position establisher(PW), a projection system(PS), and an immersion lithographic exposure device. The illumination system conditions a radiation beam. The supporting body supports the patterning device and is connected to the first position establisher. The first position establisher accurately locates the patterning device according to predetermined parameters. The substrate table holds a substrate(W). The second position establisher accurately locates the substrate according to the predetermined parameters. The projection system allows the patterning device to project a pattern included in the radiation beam to a target part(C) of the substrate. The immersion lithographic exposure device uses immersion liquid of which a pH is less than pH2 of immersion liquid of which a zeta potential is zero on the surface of the substrate.</p> |
