| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a reflective mask blank comprising at least a substrate, a multilayer reflecting film for reflecting exposure light, and an absorber for absorbing the exposure light, the absorber having a smaller film thickness for preventing the degradation of resolution around a pattern during exposure, and to provide a reflective mask. <P>SOLUTION: In the reflective mask blank, the absorber contains at least In, Ga, and Zn elements, or at least In, Ga, Sn, and O elements. The absorber has a sheet resistance value of at least≤1 MΩ/sq. and is non-polycrystal. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
