发明名称 Manufacturing method of two-dimensional transition-metal chalcogenide thin film
摘要 A manufacturing method of a two-dimensional transition-metal chalcogenide thin film includes providing a substrate, providing a reaction film, providing a source and providing a microwave. The substrate is made of material having dipole moments. The reaction film, disposed on the substrate, has a predefined thickness and includes a transition-metal compound. The source includes S, Se, or Te. The substrate is heated by the microwave to produce a heat energy to the reaction film and the source; thus a chemical reaction takes place and the two-dimensional transition-metal chalcogenide thin film is formed on the substrate. The two-dimensional transition-metal thin film includes a plurality of elements, and each of the elements aligns along a predefined direction by controlling a value of the predefined thickness.
申请公布号 US9460919(B1) 申请公布日期 2016.10.04
申请号 US201615060615 申请日期 2016.03.04
申请人 NATIONAL TSING HUA UNIVERSITY 发明人 Chueh Yu-Lun;Chen Yu-Ze;Hsieh Yi-Chen;Medina Henry
分类号 H01L21/02 主分类号 H01L21/02
代理机构 CKC & Partners Co., Ltd. 代理人 CKC & Partners Co., Ltd.
主权项 1. A manufacturing method of a two-dimensional transition-metal chalcogenide thin film, comprising: providing a substrate, wherein the substrate is made of material having dipole moments; providing a reaction film disposed on the substrate, wherein the reaction film has a predefined thickness and comprises a transition-metal compound; providing a source, wherein the source comprises S, Se or Te; and providing a microwave, wherein the substrate is heated by the microwave to produce a heat energy to the reaction film and the source, thus a chemical reaction takes place and the two-dimensional transition-metal chalcogenide thin film formed on the substrate; wherein the two-dimensional transition-metal thin film comprises a plurality of elements, and each of the elements aligns along a predefined direction by controlling a value of the predefined thickness.
地址 Hsinchu TW