发明名称 Ultraviolet laser device, and exposure device and inspection device provided with ultraviolet laser device
摘要 An ultraviolet laser device, includes: a first laser light output unit outputs a first infrared laser light; a second laser light output unit outputs a second infrared laser light; a first wavelength conversion optical system generates a first ultraviolet laser light of a fifth harmonic of the first infrared laser light; and a second wavelength conversion optical system to which the first ultraviolet laser light and the second infrared laser light enter, wherein the second wavelength conversion optical system includes a first wavelength conversion optical element which generates a second ultraviolet laser light by sum frequency generation of the first ultraviolet laser light and the second infrared laser light, and a second wavelength conversion optical element which generates a deep ultraviolet laser light by sum frequency generation of the second ultraviolet laser light and the second infrared laser light.
申请公布号 US9383653(B2) 申请公布日期 2016.07.05
申请号 US201314382093 申请日期 2013.03.05
申请人 NIKON CORPORATION 发明人 Tokuhisa Akira
分类号 G03B27/54;G03F7/20;H01S3/23;H01S3/00;G02F1/35;H01S3/067;H01S3/16 主分类号 G03B27/54
代理机构 Oliff PLC 代理人 Oliff PLC
主权项 1. An ultraviolet laser device, comprising: a first laser light output unit that outputs a first infrared laser light with a first wavelength within a wavelength band of 1520 to 1580 nm; a second laser light output unit that outputs a second infrared laser light with a second wavelength within a wavelength band of 1020 to 1100 nm; a first wavelength conversion optical system that includes a plurality of wavelength conversion optical elements and generates a first ultraviolet laser light which is a fifth harmonic with a wavelength of ⅕ of the first wavelength of the first infrared laser light by sequentially wavelength converting, by the plurality of wavelength conversion optical elements, the first infrared laser light output from the first laser light output unit; and a second wavelength conversion optical system to which the first ultraviolet laser light generated by the first wavelength conversion optical system and the second infrared laser light with the second wavelength output from the second laser light output unit enter, wherein the second wavelength conversion optical system comprises a first wavelength conversion optical element that generates a second ultraviolet laser light by sum frequency generation of the first ultraviolet laser light and the second infrared laser light with the second wavelength, and a second wavelength conversion optical element that generates a deep ultraviolet laser light with a wavelength equal to or less than 200 nm by sum frequency generation of the second ultraviolet laser light and the second infrared laser light with the second wavelength.
地址 Tokyo JP