Exposure apparatus and exposure method

摘要

The present invention provides an exposure apparatus and an exposure method. The method comprises: utilizing an exposure light source to provide light rays to the photo-resist layer; and utilizing a reflective plate to reflect the light rays passing through the photo-resist layer and the transparent substrate back to the photo-resist layer. The present invention can reduce a line space of a pattern of the photo-resist layer.

主权项

1. An exposure apparatus for exposing a photo-resist layer on a transparent substrate, wherein a transparent electrode layer is positioned between the photo-resist layer and the transparent substrate, and the exposure apparatus comprises:
a mask disposed at one side of the photo-resist layer for patterning the transparent electrode, wherein the mask includes at least one transparent opening, and a width of the transparent opening is less than 2 um; an exposure light source configured to provide light rays to the photo-resist layer, wherein the light rays provided by the exposure light source pass through the mask to reach the photo-resist layer; a reflective plate disposed at an opposite side of the photo-resist layer for reflecting the light rays passing through the photo-resist layer and the transparent substrate back to the photo-resist layer, wherein the reflective plate is parallel to the photo-resist layer on the transparent substrate when exposing it; and a projection reduction lens system disposed between the mask and the transparent substrate for projecting the light rays passing through the mask to a surface of the photo-resist layer, wherein the mask is positioned to the photo-resist layer on the transparent substrate by using an aligner.