| 发明名称 |
Antireflective films comprising microstructured surface |
| 摘要 |
The present invention concerns antireflective films comprising a high refractive index layer (60) and low refractive index layer (80) disposed on the high refractive index layer. The antireflective films have a microstructured surface (70) that can be derived from a microreplicated tool. |
| 申请公布号 |
US9383482(B2) |
申请公布日期 |
2016.07.05 |
| 申请号 |
US201113639902 |
申请日期 |
2011.05.03 |
| 申请人 |
3M Innovative Properties Company |
发明人 |
Walker, Jr. Christopher B.;Tebow Christopher P.;Pham Tri D.;Kong Steven H.;Aronson Joseph T.;Lindstrom Kyle J.;Gerlach Michael K.;Toy Michelle L.;McKenzie Taun L.;Renstrom Anthony M.;Yapel Robert A.;Johnson Mitchell A. F. |
| 分类号 |
G02B1/118;G02B5/02 |
主分类号 |
G02B1/118 |
| 代理机构 |
|
代理人 |
Fischer Carolyn A. |
| 主权项 |
1. An antireflective film comprising a high refractive index layer and a low refractive index surface layer disposed on the high refractive index layer; wherein the low refractive index layer comprises a plurality of microstructures having a complement cumulative slope magnitude distribution such that at least 30% have a slope magnitude of at least 0.7 degrees, at least 25% have a slope magnitude less than 1.3 degrees, wherein the microstructures comprise peaks having a mean equivalent circular diameter of at least 5 microns and less than 30 microns and the antireflective film is free of microstructures comprising embedded matte particles, the embedded matte particles having a particle size greater than 0.25 microns. |
| 地址 |
St. Paul MN US |
