| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition showing a preferable focus margin in the process of producing a pattern and allowing production of a resist pattern with fewer defects.SOLUTION: The resist composition includes: (A1) a resin having a structural unit expressed by formula (I); (A2) a resin having a structural unit expressed by formula (II), which is insoluble or poorly soluble with an alkali aqueous solution and can dissolve in an alkali aqueous solution by the action of an acid; and (B) an acid generator. In the formulae, Rrepresents a hydrogen atom or a methyl group. |
