发明名称 SEMICONDUCTOR DEVICE AND POWER CONVERSION DEVICE
摘要 To provide a SiC power MISFET having stable operation characteristics. In order to solve the problem, a SiC power MISFET of the present invention has a silicon (Si) atomic layer between a gate insulating film and a channel region formed in a surface layer portion of an epitaxial layer formed of SiC. The Silicon (Si) atomic layer is configured from one atomic layer, and has a thickness of approximately 0.5 nm. By forming the silicon (Si) atomic layer, a C-C bond and a Si-Si bond are not easily formed in the surface layer portion of the epitaxial layer, and occurrence of quantum roughness at the interface between the epitaxial layer and the gate insulating film can be suppressed.
申请公布号 WO2016143126(A1) 申请公布日期 2016.09.15
申请号 WO2015JP57336 申请日期 2015.03.12
申请人 HITACHI, LTD. 发明人 HISAMOTO, Digh;KOBAYASHI, Keisuke;ISHIGAKI, Takashi
分类号 H01L29/12;H01L29/739;H01L29/78 主分类号 H01L29/12
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