发明名称 |
SEMICONDUCTOR DEVICE AND POWER CONVERSION DEVICE |
摘要 |
To provide a SiC power MISFET having stable operation characteristics. In order to solve the problem, a SiC power MISFET of the present invention has a silicon (Si) atomic layer between a gate insulating film and a channel region formed in a surface layer portion of an epitaxial layer formed of SiC. The Silicon (Si) atomic layer is configured from one atomic layer, and has a thickness of approximately 0.5 nm. By forming the silicon (Si) atomic layer, a C-C bond and a Si-Si bond are not easily formed in the surface layer portion of the epitaxial layer, and occurrence of quantum roughness at the interface between the epitaxial layer and the gate insulating film can be suppressed. |
申请公布号 |
WO2016143126(A1) |
申请公布日期 |
2016.09.15 |
申请号 |
WO2015JP57336 |
申请日期 |
2015.03.12 |
申请人 |
HITACHI, LTD. |
发明人 |
HISAMOTO, Digh;KOBAYASHI, Keisuke;ISHIGAKI, Takashi |
分类号 |
H01L29/12;H01L29/739;H01L29/78 |
主分类号 |
H01L29/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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