| 摘要 |
Systems and methodologies are disclosed for generating setup information (4) for use measuring process parameters associated with semiconductor devices. A system comprises an off-line measurement instrument (20) to measure unpatterned portions (22) of a wafer (10, 22, 104, 304) and a setup information generator (30) to generate setup information (4) according to the unpatterned wafer (22) measurement. The system then provides the setup information (4) to a process measurement system (8, 110, 112, 182, 186, 320, 322, 324, 326, 420, 422, 424, 470, 472, 474, 482) for use in measuring production wafers (10, 22, 104, 304) in a semiconductor manufacturing process (6, 302, 452, 502, 602).
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