| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering system and sputtering deposition method in which a film thickness can be controlled with high accuracy and productivity is excellent. SOLUTION: In the carousel-type sputtering system installed with a substrate holder 14 within a chamber 12, ordinary magnetrons 23, 33 and AC magnetrons 27, 37 are each annexed for formation of low-refractive index films and formation of high-refractive index films. The films are formed by the AC magnetrons up to 90% of the design film thickness (target film thickness). Thereafter, the films are formed only by the ordinary magnetrons. The transmittance of a substrate 18 is measured during the deposition and film thickness control is performed by feeding back the information to a power source. COPYRIGHT: (C)2007,JPO&INPIT
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