发明名称 HIGH-PURITY VITREOUS SILICA CRUCIBLE USED FOR PULLING LARGE-DIAMETER SINGLE-CRYSTAL SILICON INGOT
摘要 <p>A high purity vitreous silica crucible for lifting a large diameter silicon single crystal ingot is provided to prevent twist or deformation by securing high intensity in a top end part of a crucible opening part. A plurality of vents(12) is formed in a graphite mold(10). A decompression unit is connected to the vent. A quartz molding body(11) is formed by accumulating a quartz powder in an inner surface of the graphite mold. The quartz molding body is maintained in an inner wall by a centrifugal force according to rotation of the graphite mold. A vitreous silica layer is formed by heating the quartz molding body by an arc discharge device(26). The arc discharge device includes a plurality of graphite electrodes(5), an electrode driving unit(4), and a power supply unit. A plurality of graphite electrodes is made of high purity carbon. The electrode driving unit moves the graphite electrode.</p>
申请公布号 KR20090064302(A) 申请公布日期 2009.06.18
申请号 KR20080119680 申请日期 2008.11.28
申请人 JAPAN SUPER QUARTZ CORPORATION 发明人 SATOU TADAHIRO
分类号 C30B15/10;C03C27/12 主分类号 C30B15/10
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