| 主权项 |
1. An extreme ultraviolet light generation system including a laser apparatus, an optical device included in the laser apparatus, comprising:
first and second optical modules disposed in a beam delivery path of a laser beam outputted from the laser apparatus; first and second beam adjusting units disposed in the beam delivery path for adjusting the beam delivery path of the laser beam; first and second measuring units disposed in the beam delivery path for detecting the beam delivery path of the laser beam passed through the first and second optical modules, respectively; a first control unit for controlling the first beam adjusting unit based on a detection result of the beam delivery path of the laser beam detected by the first measuring unit; a second control unit for controlling the second beam adjusting unit based on a detection result of the beam delivery path of the laser beam detected by the second measuring unit; a control system for controlling the first and second control units; and a positioning mechanism for positioning at least the first and second optical modules, wherein the first optical module is a first amplifier for amplifying the laser beam, the second optical module is a second amplifier disposed at an output side of the first optical module for amplifying the laser beam passed through the first optical module, the first measuring unit is disposed between the first optical module and the second optical module, the second measuring unit is disposed at an output side of the second optical module, the first beam adjusting unit is disposed at an input side of the first measuring unit, the second beam adjusting unit is disposed at an output side of the first measuring unit and at an input side of the second measuring unit, the positioning mechanism positions at least the first and second amplifiers, and the positioning mechanism further positions the first and second measuring units and the first and second beam adjusting units. |
