发明名称 |
METHOD OF FORMING METAL DEPOSITION FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide a method of forming a metal deposition film that can inhibit a resin substrate from absorbing a heat ray, inhibit deformation and dimensional variation in the resin substrate due to a rise in temperature and is excellent in productivity in vacuum deposition and the like.SOLUTION: A method of forming a metal deposition film on the resin substrate 1 includes: a first step of forming a metal deposition film with a vapor deposition heat amount of 50 to 500 J/m; and a second step of forming a metal deposition film by increasing a vapor deposition heat amount when a heat ray reflection rate of the metal deposition film becomes 50% or more, where a metal deposition source that has a heat capacity smaller than that of a metal deposition source 13 for the second step is used for a metal deposition source 11 for the first step.SELECTED DRAWING: Figure 1 |
申请公布号 |
JP2016121374(A) |
申请公布日期 |
2016.07.07 |
申请号 |
JP20140261036 |
申请日期 |
2014.12.24 |
申请人 |
KONICA MINOLTA INC |
发明人 |
MANDA YASUHARU;TAKAHASHI NOBUAKI |
分类号 |
C23C14/24;H05B33/02;H05B33/10;H05B33/26 |
主分类号 |
C23C14/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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