PRE-CLEAN CHAMBER AND PROCESS WITH SUBSTRATE TRAY FOR CHANGING SUBSTRATE TEMPERATURE

摘要

A system to remove an oxide material from a surface of a substrate comprises: a substrate tray to receive a substrate; a cooling body to receive the substrate tray; a first temperature control element to control the temperature of the substrate tray; and a second temperature control element to control the temperature of the cooling body. The first and the second temperature control element are independently controlled. A method to remove an oxide material from a surface of a substrate comprises the following steps: providing a substrate on a substrate tray having a heating element; transferring heat to a cooling body from the substrate tray to cool the substrate; depositing a halogen-containing material on the cooled substrate while the substrate is staying on the cooling body; and transferring heat to the substrate from the substrate tray to heat the cooled substrate to later sublimate the halogen-containing material.