METHOD FOR PREPARING COPPER THIN FILM BY USING SINGLE CRYSTAL COPPER TARGET

摘要

The present invention relates to a method for preparing a copper thin film by using a single crystal copper target and, more specifically, to a method for preparing a copper thin film by using a single crystal copper target, the method performing deposition on a sapphire disc substrate with a high-frequency sputtering method by using a single crystal copper target grown by the Czochralski process, thereby preparing a copper thin film with excellent quality with respect to crystallinity. The subject matter of the present invention is a method for preparing a copper thin film by using a single crystal copper target, the method using a disc-shaped single crystal copper target obtained by cutting cylindrical single crystal copper grown by the Czochralski process, so as to perform deposition on a sapphire disc substrate by a high-frequency sputtering method, thereby forming and preparing a copper thin film.