| 摘要 |
Imaging system of a microlithographic projection exposure apparatus with a projection objective ( 200, 300, 500, 600 ) that serves to project an image of a mask which can be set into position in an object plane onto a light-sensitive coating layer which can be set into position in an image plane, and with a liquid-delivery device ( 205 ) serving to fill immersion liquid ( 202, 310, 507 ) into an interstitial space between the image plane and a last optical element ( 201, 309, 506 ) on the image-plane side of the projection objective; wherein the last optical element on the image-plane side of the projection objective is arranged so that, seen in the direction of gravity, it follows the image plane; and wherein the projection objective is configured in such a way that when the system is operating with immersion, the immersion liquid has at least in some areas a convex-curved surface facing in the direction away from the image plane. It is also proposed for the last optical element ( 201, 309, 506 ) on the image-plane side of the projection objective to be arranged below the image plane in such a way that the immersion liquid ( 202, 310, 507, 601 ) is held at least in part in a substantially tub-shaped area on the last optical element on the image-plane side. Also, a rotator can be provided which serves to rotate a substrate carrying the light-sensitive coating ( 401 ) between a transport orientation in which the light-sensitive coating lies on a substrate surface that faces against the direction of gravity and an exposure orientation in which the light-sensitive coating ( 401 ) lies on a substrate surface that faces in the direction of gravity.
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