发明名称 ELECTRONIC DEVICE AND METHOD FOR FABRICATING THE SAME
摘要 This patent document provides an electronic device including a semiconductor memory that can simplify a fabrication process and improve characteristics of a variable resistance element, and a method for fabricating the same. In one aspect, an electronic device including a semiconductor memory is provided, wherein the semiconductor memory includes: a substrate; a variable resistance element formed over the substrate and exhibiting different resistance states to store data; an interlayer insulating layer formed over the substrate to surround at least a portion of the variable resistance element; an upper electrode contact formed over the variable resistance element to penetrate a portion of the interlayer insulating layer and be in contact with the variable resistance element; and a metal wiring formed over the interlayer insulating layer, and configured to include a stacked structure of a tungsten layer and a barrier layer, wherein the barrier layer is in contact with the upper electrode contact and includes tungsten, boron and iridium.
申请公布号 US2016181204(A1) 申请公布日期 2016.06.23
申请号 US201514846808 申请日期 2015.09.06
申请人 SK hynix Inc. 发明人 Do Kwan-Woo
分类号 H01L23/532;G06F12/08;H01L43/08;H01L23/528;H01L45/00;H01L43/02 主分类号 H01L23/532
代理机构 代理人
主权项 1. An electronic device comprising a semiconductor memory, the semiconductor memory comprising: a substrate; a variable resistance element formed over the substrate and exhibiting different resistance states to store data; an interlayer insulating layer formed over the substrate to surround at least a portion of the variable resistance element; an upper electrode contact formed over the variable resistance element to penetrate a portion of the interlayer insulating layer and be in contact with the variable resistance element; and a metal wiring formed over the interlayer insulating layer, and comprising a stacked structure of a tungsten layer and a barrier layer, wherein the barrier layer is in contact with the upper electrode contact and comprises tungsten, boron and iridium.
地址 Icheon-Si KR