REFLECTIVE MIRROR FOR CUT-OFF GHI-LINE

摘要

The present invention provides a reflection filter for blocking a GHI-line which provides a multi-scanning type exposure device configured to perform good projection exposure by using a plurality of optical projection units (PL1-PL11) having an enlargement magnification while suppressing an influence of a weight change of a filter on image formation on a photosensitive substrate (P) and which provides an optical projection unit having a magnification higher than the same magnification by projection-exposing a pattern of a mask (M) to the photosensitive substrate while the mask and the photosensitive substrate are moved along a scanning direction with respect to the plurality of optical projection units.