MEASURING METHOD, STAGE APPARATUS, AND EXPOSURE APPARATUS

摘要

An exposure apparatus can mitigate the impact of fluctuations in the refractive index of ambient gas, and improve, for example, stage positioning accuracy. An exposure apparatus radiates an exposure illumination light to a wafer on a wafer stage through a projection optical system, and forms a prescribed pattern on the wafer, and comprises: a scale, which is provided to the wafer stage; a plurality of X heads, which detect information related to the position of the scale; a measurement frame that integrally supports the plurality of X heads and has a coefficient of linear thermal expansion that is smaller than that of the main body of the wafer stage (portions excepting a plate wherein the scale is formed); and a control apparatus that derives information related to the displacement of the wafer stage based on the detection results of the plurality of X heads.

主权项

1. An exposure apparatus for exposing a substrate with illumination light via a projection optical system, the apparatus comprising:
a frame member for supporting the projection optical system; a detection system provided at the frame member apart from the projection optical system and configured to detect a mark of the substrate; a plurality of grating members, each of which having a reflecting-type grating, and each of which being provided at the frame member such that the reflecting-type grating is arranged substantially parallel with a predetermined plane perpendicular to an optical axis of the projection optical system; a base arranged below the projection optical system and the detection system; a stage arranged on the base, the stage having a holder configured to hold the substrate and being movable below the grating members; a drive system configured to move the stage so as to arrange the substrate opposite to the projection optical system and the detection system, respectively; an encoder system having a plurality of heads provided at the stage, each of which being configured to irradiate a beam onto the grating member from below the grating member, so as to obtain position information of the stage; and a controller configured to control the drive system based on the position information obtained by the encoder system, wherein the grating members are supported via a flexural member by the frame member.