| 发明名称 |
EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE |
| 摘要 |
An exposure apparatus exposes a peripheral portion of a substrate to light, and includes an optical system configured to irradiate the substrate with the light, a stage configured to hold the substrate and be moved in a direction to position the substrate in a direction perpendicular to the optical axis of the optical system, and a controller configured to cause the stage to be moved. The controller moves the stage based on information about a distance between the optical system and the peripheral portion in a direction parallel to the optical axis and a telecentricity of the optical system so that a predetermined portion of the substrate is irradiated with the light from the optical system. |
| 申请公布号 |
US2016209763(A1) |
申请公布日期 |
2016.07.21 |
| 申请号 |
US201614994686 |
申请日期 |
2016.01.13 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
Saito Nobuyuki |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An exposure apparatus that exposes a peripheral portion of a substrate to light, the apparatus comprising:
an optical system configured to irradiate the substrate with the light; a stage configured to hold the substrate and be moved in a direction to position the substrate in a direction perpendicular to an optical axis of the optical system; and a controller configured to cause the stage to be moved, wherein the controller is configured to cause the stage to be moved based on information about a distance between the optical system and the peripheral portion in a direction parallel to the optical axis and a telecentricity of the optical system so that a predetermined portion of the substrate is irradiated with the light from the optical system. |
| 地址 |
Tokyo JP |
