MIRROR, MORE PARTICULARLY FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

摘要

A mirror, in particular for a microlithographic projection exposure apparatus has an optically effective surface (11), a mirror substrate (12), a reflection layer stack (21) for reflecting electromagnetic radiation that is incident on the optical effective surface, and at least two piezoelectric layers (16a, 16b, 16c), which are arranged successively between the mirror substrate and the reflection layer stack in the stack direction of the reflection layer stack and to which an electric field can be applied to produce a locally variable deformation, wherein at least one intermediate layer (22a, 22b) made of crystalline material is arranged between the piezoelectric layers (16a, 16b, 16c), wherein the intermediate layer is designed to leave an electric field, which is present in the region of the piezoelectric layers (16a, 16b, 16c) that adjoin the intermediate layer (22a, 22b) in the stack direction of the reflection layer stack (21), substantially uninfluenced.

主权项

1. A mirror having an optically effective surface, comprising
a mirror substrate; a reflection layer stack configured to reflect electromagnetic radiation that is incident on the optically effective surface; at least a first and a second piezoelectric layer, which are arranged successively between the mirror substrate and the reflection layer stack in a stack direction of the reflection layer stack and configured to receive an electric field to produce a locally variable deformation in the piezoelectric layers; and at least one intermediate layer of crystalline material arranged between the first and the second piezoelectric layers; wherein the intermediate layer has substantially no influence on an electric field applied in a region of the piezoelectric layers that adjoin the intermediate layer in the stack direction of the reflection layer stack.