SUBSTRATE PROCESSING SYSTEMS HAVING MULTIPLE GAS FLOW CONTROLLERS

摘要

A system for depositing a layer on a substrate includes a processing chamber including a gas inlet, a plurality of gas flow controllers connected in fluid communication with a gas supply source, a gas distribution plate disposed between the plurality of gas flow controllers and the gas inlet, and a gas injection cap connected in fluid communication between the plurality of gas flow controllers and the gas distribution plate. The gas distribution plate defines a plurality of holes, and the gas injection cap defines a plurality of gas flow passages, each extending from an inlet connected to one of the gas flow controllers to an outlet connected in fluid communication with at least one of the holes in the gas distribution plate. Each of the gas flow controllers is disposed proximate to the gas injection cap.

主权项

1. A system for depositing a layer on a substrate, the system comprising:
a processing chamber including a gas inlet disposed at an upstream end of the processing chamber; a plurality of gas flow controllers connected in fluid communication with a gas supply source, the plurality of gas flow controllers including at least three gas flow controllers; a gas distribution plate disposed between the plurality of gas flow controllers and the gas inlet, the gas distribution plate defining a plurality of holes; and a gas injection cap connected in fluid communication between the plurality of gas flow controllers and the gas distribution plate, the gas injection cap defining a plurality of gas flow passages each extending from an inlet connected to one of the gas flow controllers to an outlet connected in fluid communication with at least one of the holes in the gas distribution plate, wherein each of the gas flow controllers is disposed proximate to the gas injection cap.