SEMICONDUCTOR PROCESSING REACTOR AND COMPONENTS THEREOF

摘要

A reactor having a housing that encloses a gas delivery system operatively connected to a reaction chamber and an exhaust assembly. The gas delivery system includes a plurality of gas lines for providing at least one process gas to the reaction chamber. The gas delivery system further includes a mixer for receiving the at least one process gas. The mixer is operatively connected to a diffuser that is configured to diffuse process gases. The diffuser is attached directly to an upper surface of the reaction chamber, thereby forming a diffuser volume therebetween. The diffuser includes at least one distribution surface that is configured to provide a flow restriction to the process gases as they pass through the diffuser volume before being introduced into the reaction chamber.

主权项

1. A diffuser for distributing at least one process gas, said diffuser comprising:
an inlet portion having a channel formed therethrough for receiving said at least one process gas; and a distribution portion attached to said inlet portion, said distribution portion comprising a mounting surface, a first distribution surface, a second distribution surface, a third distribution surface, and a fourth distribution surface, wherein said first, second, third, and fourth distribution surfaces extend laterally between a first side surface and a second side surface, and wherein said first and second side surfaces extend between said first, second, third, and fourth distribution surfaces and said mounting surface.