发明名称 P-type doping layers for use with light emitting devices
摘要 A light emitting diode (LED) comprises an n-type Group III-V semiconductor layer, an active layer adjacent to the n-type Group III-V semiconductor layer, and a p-type Group III-V semiconductor layer adjacent to the active layer. The active layer includes one or more V-pits. A portion of the p-type Group III-V semiconductor layer is in the V-pits. A p-type dopant injection layer provided during the formation of the p-type Group III-V layer aids in providing a predetermined concentration, distribution and/or uniformity of the p-type dopant in the V-pits.
申请公布号 US9490392(B2) 申请公布日期 2016.11.08
申请号 US201514887582 申请日期 2015.10.20
申请人 Toshiba Corporation 发明人 Ting Steve
分类号 H01L31/0256;H01L33/12;H01L21/02;H01L33/00;H01L33/02;H01L33/32;H01L33/06;H01L33/14;H01L33/24;H01L33/08 主分类号 H01L31/0256
代理机构 Norton Rose Fulbright US LLP 代理人 Norton Rose Fulbright US LLP
主权项 1. A light emitting diode (LED), comprising: a substrate; an n-doped Group III-V semiconductor layer adjacent the substrate; a u-doped Group III-V layer adjacent the n-doped Group III-V semiconductor layer, the u-doped layer generating V-pits; an active layer adjacent the u-doped Group III-V semiconductor layer, the active layer comprising a portion that extends into the V-pits;an electron blocking layer adjacent the active layer, the electron blocking layer comprising a portion that extends into the V-pits; anda p-doped Group III-V semiconductor layer adjacent the electron blocking layer, the p-doped Group III-V semiconductor layer comprising a portion that extends into the V-pits, wherein: the portion of the p-doped Group III-V semiconductor layer that extends into the V-pits is a first portion;the p-doped Group III-V semiconductor layer additionally comprises a second portion that does not extend into the V-pits; anddopant characteristics of the first portion differ from dopant characteristics of the second portion.
地址 Tokyo JP