首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
CHARGED PARTICLE BEAM EXPOSURE DEVICE
摘要
申请公布号
JPH11317186(A)
申请公布日期
1999.11.16
申请号
JP19980134231
申请日期
1998.04.30
申请人
NIKON CORP
发明人
SHIMIZU HIROYASU
分类号
G03F7/20;H01J37/141;H01J37/305;H01L21/027;(IPC1-7):H01J37/141
主分类号
G03F7/20
代理机构
代理人
主权项
地址
您可能感兴趣的专利
Latent metallocene catalyst systems for olefin polymerization
PERFEZIONAMENTO AI SISTEMI DI CONVERSIONE DELL'ENERGIA SOLARE IN ENERGIA ELETTRICA.
Plasma processor coil
Biofuel particles comprising sewage sludge, cellulosic material and binder, prepared by coating a granular mixture of these components with a mixture of binder and sludge
Equipment for movement of goods to and from load pallet comprises movement device with number of segments vertically movable relatively to each other between first and second positions
Digital demodulator i ett flerkanalssystem
Förfarande för torkning av virke
SISTEMA PER LA TRASMISSIONE DI FLUSSI INFORMATIVI MULTIMEDIALI AD ESEMPIO PER INSEGNAMENTO A DISTANZA.
TELAIO PORTAUTENSILI PER TRATTORE
Anordning innefattande ett luftfilter och en membranförgasare
Patron för IR-avledning och avledningsanordning innefattande en sådan patron
ENCOFRADO RECUPERABLE PARA MUROS Y SIMILARES.
Protein modification and maintenance molecules
Immune response associated proteins
Purified polypeptides involved in co-factor metabolism
Immunoglobulin having particular framework scaffold and methods of making and using
System and method for producing a bait station of wax matrix material
Production of support-bonded molecules by means of oligonucleotide tags
Extracellular regulated kinase 2 (erk2)
Chalcogenide-based medium and optical devices therefrom
