发明名称 Semiconductor element with N channel and P region connected only to the channel and liquid crystal display device using the same
摘要 To prevent an n-channel thin-film transistor from being deteriorated by hot holes generated in a gate-negative pulse mode, a thin polysilicon film 10 is provided with a p-type semiconductor region 13 in contact with a channel region 14. The p-type semiconductor region 13 is electrically connected to nowhere except the channel region 14. Holes induced on the surface due to a gate-negative pulse are further supplied from the p-type semiconductor region 13. An electric field established by the gate-negative pulse is relaxed by the holes, fewer hot holes are injected into the gate oxide film, and the TFT characteristics are less deteriorated.
申请公布号 US6166786(A) 申请公布日期 2000.12.26
申请号 US19980074314 申请日期 1998.05.08
申请人 HITACHI, LTD. 发明人 OHKUBO, TATSUYA;KAWACHI, GENSHIRO;MIKAMI, YOSHIRO;MASUDA, KAZUHITO;KAGEYAMA, HIROSHI
分类号 G02F1/136;G02F1/1368;H01L21/336;H01L27/12;H01L29/786;(IPC1-7):G02F1/136;H01L29/04 主分类号 G02F1/136
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