MOLECULAR GLASS PHOTORESIST

摘要

PROBLEM TO BE SOLVED: To provide a new photoresist suitable for extreme ultraviolet (EUV) exposure.

SOLUTION: Some low-molecular molecular glass having a new structure designed for use as a photoresist in semiconductor lithography is used. The photoresist is a low-molecular-weight organic material having a significantly higher glass transition temperature than room temperature and showing a tendency to crystallize hardly. The molecular glass photoresist has a tetrahedral silane molecular nucleus having four phenyl groups or four biphenyl groups. Each phenyl group lateral to each phenyl group or biphenyl group has a methoxy group or a hydroxy group in the 3- or 4-position. With respect to the implementation of the biphenyl, the bond may be meta-meta, meta-para, para-para or para-meta.

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