| 摘要 |
PROBLEM TO BE SOLVED: To develop a method of manufacturing an optical sensor reducing complexity in a manufacturing process. SOLUTION: The method of manufacturing the optical sensor is provided. In a system of such a manufacturing process, a diode structure can be formed only by a single lithography etching. Further, in the system, since source/drain electrodes can be directly formed on a gate electrode dielectric layer, a conventional plug structure can be abolished. Furthermore, a diode lamination layer structure can be formed on either of source/drain electrode, so that the structure of the optical sensor can be more simplified. COPYRIGHT: (C)2009,JPO&INPIT
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