| 摘要 |
PROBLEM TO BE SOLVED: To properly perform a dummy shot by a peripheral exposure apparatus.SOLUTION: A peripheral exposure apparatus 42 exposes a peripheral edge of a wafer coated with a resist film and the apparatus includes: an imaging part that captures an image of the surface of the wafer W; a wafer chuck that holds the wafer W; an exposure part 130 that exposes a peripheral edge of the wafer held by the wafer chuck; a chuck driving part that moves and rotates the wafer chuck; an exposure driving part that moves the exposure part 130; and a control part 200 that acquires arrangement information of shots of patterns on the wafer from a substrate image captured by the imaging part and controls the chuck driving part and the exposure driving part to expose the peripheral edge of the wafer W on the basis of the acquired arrangement information.SELECTED DRAWING: Figure 6 |
