发明名称 Wet-strippable silicon-containing antireflectant
摘要 Wet-strippable antireflective compositions comprising one or more silicon-containing polymers that are free of Q-monomers and hydridosilanes as polymerized units are provided. These compositions are useful in the manufacture of various electronic devices.
申请公布号 US9442377(B1) 申请公布日期 2016.09.13
申请号 US201514739402 申请日期 2015.06.15
申请人 Rohm and Haas Electronic Materials LLC 发明人 Ongayi Owendi;Cutler Charlotte;Li Mingqi;Yamada Shintaro;Cameron James
分类号 G03F7/075;G03F7/11;G03F7/40;G03F7/09;C08G77/28;C08G77/14;G03F7/20;C09D183/08;C09D183/06;C08G77/18 主分类号 G03F7/075
代理机构 代理人 Cairns S. Matthew
主权项 1. The present invention provides a siloxane polymer comprising as polymerized units one or more first monomers of formula (1) or dimers thereof and one or more second monomers of formula (2) or dimers thereof R2SiX2  (1) RSiX3  (2) wherein each R is independently chosen from aryl, aralkyl, alkyl, alkenyl, aralkenyl, and R1; R1 is a C2-30 organic radial comprising one or more —C(O)—O—C(O)— moieties; and each X is a hydrolyzable moiety; wherein at least one R is R1; and wherein ≧30% of the monomers comprising the polymer comprise one or more functional moieties chosen from hydroxy, mercapto, epoxy, glycidyloxy, cyano, alkyleneoxy, sulfolanyl, and —C(O)—O—C(O)—; and wherein the polymer is free of monomers of the formula HSiX3 and SiX4 as polymerized units.
地址 Marlborough MA US