WIRING PATTERN MANUFACTURING METHOD, TRANSISTOR MANUFACTURING METHOD, AND TRANSFER MEMBER

摘要

The purpose of the present invention is to provide a new method as a technology replacing the conventional technology for obtaining a thin film with a wiring pattern. The method for manufacturing a wiring pattern according to the present invention is characterized by being provided with: a laminate forming step of forming a laminate by bringing a first member having a resist layer and a metal layer formed on the resist layer, and a second member having a substrate into contact with each other; a resist layer patterning step of patterning the resist layer; and an etching step of selectively removing the metal layer.