发明名称 METHOD OF MANUFACTURING THIN-FILM ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a thin-film element in which a metal oxide film of a (100) orientation can be easily formed. <P>SOLUTION: The method of manufacturing the thin-film element includes a step of forming a titanium oxide film 16 on the upper part of a base by a method of applying a titanium compound solution, a step of forming a Pt-based lower electrode film 20 on the upper part of the titanium oxide film 16, and a step of forming a metal oxide film 22 containing at least any one of a lead titanate and a lead zirconate on the upper part of the Pt-based electrode film 20. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007242778(A) 申请公布日期 2007.09.20
申请号 JP20060060952 申请日期 2006.03.07
申请人 SEIKO EPSON CORP 发明人 HAMADA YASUAKI;OHASHI KOJI
分类号 H01L21/8246;H01L27/105;H01L41/09;H01L41/187;H01L41/22;H01L41/318;H01L41/319 主分类号 H01L21/8246
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