发明名称 |
Device for interstitial fluid extraction, production process thereof and analyzing process of interstitial fluid using the device |
摘要 |
A device for interstitial fluid extraction, having a base material formed from a synthetic resin film, a pressure sensitive adhesive layer, a hydrogel layer formed from at least one hydrophilic polymer selected from the group consisting of polyvinyl alcohol and polyvinyl pyrrolidone, and a release layer, wherein the hydrogel layer has an area of a size that the pressure sensitive adhesive layer is exposed from around the hydrogel layer, does substantially not contain a sodium ion and causes no water separation. |
申请公布号 |
US9380964(B2) |
申请公布日期 |
2016.07.05 |
申请号 |
US201313975854 |
申请日期 |
2013.08.26 |
申请人 |
NICHIBAN CO., LTD.;SYSMEX CORPORATION |
发明人 |
Hagino Kei;Kojima Junko;Takezaki Akihito;Koike Reona;Isobe Kazuki |
分类号 |
A61B5/145;A61B10/00;A61B5/1455;C08J3/075 |
主分类号 |
A61B5/145 |
代理机构 |
Porter, Wright, Morris & Arthur, LLP |
代理人 |
Porter, Wright, Morris & Arthur, LLP |
主权项 |
1. A device for interstitial fluid extraction, comprising
(a) a base material formed from a synthetic resin film comprising a polyethylene film, a polypropylene film, a polyester film or a polyurethane film; (b) a hydrogel layer formed from at least one hydrophilic polymer selected from the group consisting of polyvinyl alcohol and polyvinyl pyrrolidone; (c) an adhesive layer arranged between the base material and the hydrogel layer; and (d) a release layer, wherein
(i) the hydrogel layer has a smaller surface area than a surface area of the adhesive layer whereby a portion of a surface of the adhesive layer is exposed around the hydrogel layer, (ii) the release layer covers the exposed surface of the adhesive layer and an exposed surface of the hydrogel layer, (iii) the hydrogel layer contains not more than 30 ppm sodium ion, and (iv) the hydrogel layer exhibits no water separation when the hydrogel layer is held in a flat state for 1 minute in a thermohygrostat at 23° C. and 55% relative humidity. |
地址 |
Tokyo JP |