发明名称 Wafer support plate for supporting a wafer during the process of producing a semi-conductor identifies a wafer's position on the support plate during heat treatment while detecting the wafer's correct position on the plate.
摘要 A wafer support plate (10) for a TRACK system has a support plate body, six carrying supports (30) on the support plate body to hold a wafer and six laser emitter-detector measuring devices (231-236), each of which fits alongside a carrying support and inside the area encompassed by the carrying supports on the support plate.
申请公布号 DE10033817(A1) 申请公布日期 2001.11.08
申请号 DE20001033817 申请日期 2000.07.12
申请人 PROMOS TECHNOLOGIES, INC.;MOSEL VITELIC INC., HSIN CHU;INFINEON TECHNOLOGIES INC. 发明人 CHEN, BRAD
分类号 H01L21/683;G01B11/03;H01L21/00;H01L21/68;H01L21/687;(IPC1-7):H01L21/68 主分类号 H01L21/683
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