| 摘要 |
PROBLEM TO BE SOLVED: To provide a film-forming apparatus in which nozzle conditions and sputter conditions can be set independently. SOLUTION: The apparatus allows film-formation of ultra-fine particles contained in an aerosol on a substrate. The apparatus is equipped with a pressure-reducible film-forming chamber into which a gas is introduced, a pressure-reducible nozzle chamber connected to the film-forming chamber and a barrier positioned between the film-forming chamber and the nozzle chamber. The nozzle chamber is equipped with a nozzle which forms an aerosol flow. The barrier has an aperture for passing the ultra-fine particles released from the nozzle while maintaining the pressure difference between the film-forming chamber and the nozzle chamber. The film-forming chamber is equipped with a substrate holder which can displace the substrate relatively to the nozzle while keeping it faced to the nozzle. A sputter cathode is positioned inside the film-forming chamber to apply sputter particles to the ultra-fine particles before they reach the substrate. |
