| 摘要 |
<p>An apparatus for processing a substrate is provided to perform a half-exposure process, a melting process, a reflow process and a transformation process by including a substrate carrier, a chemical supply unit and a gas supply unit. A substrate is transferred by a substrate carrier(12). A chemical supply unit(3) supplies chemical to the substrate. A gas supply unit(4) supplies a gas atmosphere to the substrate. A temperature control unit for controlling the temperature of the substrate is further included. A control unit(24) controls the substrate carrier, the chemical supply unit and the gas supply unit so that the chemical is supplied to the substrate by the chemical supply unit before the gas atmosphere is supplied to the substrate by the gas supply unit.</p> |
