| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning method of plasma processing equipment efficiently and promptly without causing damage to an internal wall face of a treatment container or to a member in the treatment container. SOLUTION: In the cleaning method of the plasma processing equipment, plasma treatment using plasma is applied to a workpiece W in the treatment container 32, which can be put in vacuum. The method includes a first cleaning step of keeping first pressure in the treatment container and performing cleaning by generating plasma while cleaning gas is fed into the treatment container 32; and a second cleaning step for keeping second pressure, which is higher than the first pressure, in the treatment container and performing cleaning by generating plasma gas while cleaning gas is fed into the treatment container 32. In this way, without causing damage to the internal wall face of a treatment container or to a member in the treatment container, the cleaning can performed efficiently and promptly. COPYRIGHT: (C)2008,JPO&INPIT
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