发明名称 |
OPTICAL PROXIMITY CORRECTION (OPC) ACCOUNTING FOR CRITICAL DIMENSION (CD) VARIATION FROM INTER-LEVEL EFFECTS |
摘要 |
Various embodiments include computer-implemented methods, computer program products and systems for modeling at least one feature in an integrated circuit (IC) layout for an inter-layer effect. In some cases, approaches include a computer-implemented method of modeling at least one feature in an IC layout for an inter-level effect, the method including: building a set of shape measurement regions each connected with an edge of the at least one feature; determining a set of shape parameters for each shape measurement region in the set of shape measurement regions; and creating a column vector representing each shape measurement region using the set of shape parameters, the column vector representing the inter-layer effect of the at least one feature, wherein the inter-layer effect includes a physical relationship between the at least one feature and another feature on a distinct level of the IC layout. |
申请公布号 |
US2016217249(A1) |
申请公布日期 |
2016.07.28 |
申请号 |
US201615092084 |
申请日期 |
2016.04.06 |
申请人 |
International Business Machines Corporation |
发明人 |
Banerjee Shayak;Chidambarrao Dureseti;Shao Dongbing |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
1. A computer-implemented method, performed on at least one computing device, of modeling at least one feature in an integrated circuit (IC) layout for an inter-level effect, the method comprising:
building a set of shape measurement regions each connected with an edge of the at least one feature, each shape measurement region increasing in width as it moves away from the edge; and creating a column vector representing each shape measurement region using the set of shape parameters, the column vector representing the inter-layer effect of the at least one feature. |
地址 |
Armonk NY US |