| 摘要 |
PROBLEM TO BE SOLVED: To provide a sample dimension measuring method for measuring and inspecting a high aspect pattern with high accuracy while suppressing beam irradiation amount, and to provide a charged particle beam apparatus.SOLUTION: In the charged particle beam apparatus for detecting a signal obtained based on scanning of a sample with a charged particle beam discharged from a charged particle source, multiple focal points are extracted based on detection signals obtained by scanning with a charged particle beam, while changing the focal point of the charged particle beam in the field of view. |
