ナノインプリント方法、その方法に使用されるモールドおよびその方法を利用したパターン化基板の製造方法

摘要

PROBLEM TO BE SOLVED: To further reduce occurrence of a mold release defect on a main pattern in nanoimprint.SOLUTION: In a nanoimprint method, a mold 1 is released from a resist while bending the mold 1 and a substrate 2 in at least one state between a state where a bending center C1 of the mold 1 at the end of mold release is deviated from a pattern center P1 of the mold 1 corresponding to a central position of a minimum circumscribed circle CC, and a state where a bending center C2 of the substrate 2 at the end of mold release is deviated from a pattern center P2 of the substrate 2 corresponding to the central position of the minimum circumscribed circle CC, in such a manner that a mold release end E is out of a region included in the minimum circumscribed circle CC in a pattern region 10.