发明名称 Method and apparatus for monitoring the condition of plasma equipment
摘要 An apparatus (100) senses a degree of cleanliness of a plasma reactor having a chamber (102) containing a plasma (103) that emits light (104) during a process conducted in the chamber (102). The apparatus (100) also has a light sensing element (180), configured to sense an intensity of the light (104) emitted by the plasma (103) after the light (104) passes through a film (135) that accrues in the chamber (102) during the process, and to provide a light intensity indication signal, and an electronics assembly (170) configured to receive the light intensity indication signal and to provide an indication of the degree of cleanliness of the plasma reactor.
申请公布号 US2004184028(A1) 申请公布日期 2004.09.23
申请号 US20040484723 申请日期 2004.05.11
申请人 FINK STEVEN T.;WINDHORN THOMAS 发明人 FINK STEVEN T.;WINDHORN THOMAS
分类号 G01N21/59;H01J37/32;(IPC1-7):G01N21/00 主分类号 G01N21/59
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