发明名称 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
摘要 In target shape reconstruction, in order to determine efficiently and quickly the profile of complex targets on a substrate, the various degrees of freedom or variable parameters of the various shapes of which a single profile is made up can be reduced by linking together the variable parameters using simple formulae or by approximating the shape of the overall profile such that it takes in to account the various shapes making up that profile. Fewer parameters gives rise to fewer iterations of calculations on those parameters, which increases the speed of profile reconstruction.
申请公布号 US2008068616(A1) 申请公布日期 2008.03.20
申请号 US20060520789 申请日期 2006.09.14
申请人 ASML NETHERLANDS B.V. 发明人 KIERS ANTOINE GASTON MARIE;NAUMOSKI GOCE
分类号 G01B11/24 主分类号 G01B11/24
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