发明名称 METHOD OF MANUFACTURING ABSORPTIVE MULTILAYER FILM ND FILTER
摘要 PROBLEM TO BE SOLVED: To provide an absorptive multilayer film ND (neutral density) filter which is constituted by providing an absorptive multilayer film for attenuating transmitted light in a visible light region on a resin film being a substrate, which is excellent in optical characteristics without changing film structure of the absorptive multilayer film and further in which no crack occurs even under high temperature and high humidity environment. SOLUTION: The resin film before film deposition is subjected to plasma treatment or ion beam treatment to thermally contract the resin film by 0.2% or more. Then an oxide dielectric film layer and a metallic absorption film layer are alternatively laminated by a sputtering method or the like on at least one side of the resin film to form the absorptive multilayer film. Even when the obtained absorptive multilayer film ND is left in an environmental testing machine under the temperature of 80°C and humidity of 90% for 24 hours, no crack occurs in the absorptive multilayer film. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008209443(A) 申请公布日期 2008.09.11
申请号 JP20070043408 申请日期 2007.02.23
申请人 SUMITOMO METAL MINING CO LTD 发明人 OGAMI HIDEHARU
分类号 G02B5/00 主分类号 G02B5/00
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