| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of achieving higher hardness while using an epoxy group-containing acrylic resin, a photosensitive resin laminate and a pattern forming method. <P>SOLUTION: The photosensitive resin composition comprises (A) the epoxy group-containing acrylic resin, (B) a photopolymerization initiator and (C) a sensitizer, wherein an onium salt of a specific structure is used as the component (B) and at least one selected from 1,5-dihydroxynaphthalene, 2,3-dihydroxynaphthalene and 2,6-dihydroxynaphthalene is used as the component (C). <P>COPYRIGHT: (C)2009,JPO&INPIT |
