发明名称 |
(Meth)acrylamide derivative, polymer, chemically amplified photosensitive resin composition, and patterning method |
摘要 |
The present invention relates to a novel (meth)acrylamide compound represented by the general formula (1), a (co)polymer of the (meth)acrylamide compound, and a chemically amplified photosensitive resin composition composed of the polymer and a photoacid generator. In the formula, R1 represents a hydrogen atom or a methyl group; R2 represents an acid-decomposable group; and R3 to R6 independently represent a hydrogen atom, a halogen atom or an alkyl group having 1 to 4 carbon atoms.
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申请公布号 |
US7939241(B2) |
申请公布日期 |
2011.05.10 |
申请号 |
US20060919891 |
申请日期 |
2006.05.12 |
申请人 |
NEC CORPORATION |
发明人 |
MAEDA KATSUMI;NAKANO KAICHIROU |
分类号 |
G03F7/039;G03F7/20;G03F7/30;G03F7/38;G03F7/40 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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